【Creating Greater Capacity on Smaller Spaces】
-Electron Beam Recorders for Mastering and NanoImprint
Lithography for HVM-Production of Patterned Magnetic Media-

The smaller the magnetic bits are the larger becomes the risk for superparamagnetic relaxation. A way to circumvent this is to shift to patterned media, where discrete track recording (DTR) and bit-patterned media (BPM) are the most promising technologies. Patterning magnetic media is expected to allow data densities up to 20 Tb/in2. Manufacturing of such discs can be realized using an electron beam recorder for production of a master stamp and nanoimprint lithography for replication on glass or aluminum disks.
The process used for replication magnetic media disks via nanoimprinting is based on a two-step imprint process comprising the generation of an intermediate polymer stamp (IPS(r)) and a simultaneous thermal and UV imprint process (STU(r)). Both imprint tool and process are capable for high volume manufacturing and the combination of EBR-mastering with NIL enables high volume manufacturing with 600 double-sided disks/hour. Our soft-press(r) technology guarantees residual layers below 20 nm across the entire substrate being important for subsequent pattern transfer. Already today we can master patterned magnetic media with a linewidth down to 30 nm and reproduce the master patterns with our proprietary IPS(r)-STU(r) process on HDD-substrates.